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Plasma Science & Semiconductor Manufacture

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Finding the One Solution for Multiscale Multiphysics Modeling in Wafer ProcessingFinding the One Solution for Multiscale Multiphysics Modeling in Wafer Processing

TEL Technology Center, Albany, NY
Semiconductor wafer manufacturing involves a number of processes, ranging in size from nanometers to meters. This, along with coupling the physics of chemical...

Modeling a Copper-deposition SystemModeling a Copper-deposition System

Replisaurus Technologies AB, Kista, Sweden
Only through advanced packaging techniques can we take advantage of state-of-the-art microelectronic devices. The flip-chip method has become a cost-effective...

Example Models

Boat Reactor for Low Pressure Chemical Vapor DepositionBoat Reactor for Low Pressure Chemical Vapor Deposition

Chemical vapor deposition (CVD) is an important step in the process of manufacturing microchips. One of the common applications is the deposition of silicon on wafers at low pressure. Low pressure reactors are used to get a high...

Friction Stir Welding of an Aluminum PlateFriction Stir Welding of an Aluminum Plate

In friction stir welding, a rotating tool moves along the weld joint and melts the aluminum through the generation of friction heat. The tool’s rotation stirs the melted aluminum such that the two plates are joined. In this model,...

Chemical Vapor Deposition of GaAsChemical Vapor Deposition of GaAs

Chemical vapor deposition (CVD) allows a thin film to be grown on a substrate through molecules and molecular fragments adsorbing and reacting on a surface. This example illustrates the modeling of such a CVD reactor where...

Argon Boltzmann AnalysisArgon Boltzmann Analysis

The electron energy distribution function (EEDF) plays an important role in the overall behavior of discharges. Analytic forms of the EEDF exist such as Maxwellian or Druyvesteyn, but in some cases they fail to fit the discharge...

Dielectric Barrier DischargeDielectric Barrier Discharge

This model simulates electrical breakdown in an atmospheric pressure gas. Modeling dielectric barrier discharges in more than one dimension is possible, but the results can be difficult to interpret because of the amount of competing...

GEC ICP Reactor, Argon ChemistryGEC ICP Reactor, Argon Chemistry

The GEC cell was introduced by NIST in order to provide a standardized platform for experimental and modeling studies of discharges in different laboratories. The plasma is sustained via inductive heating. The Reference Cell operates as...

Thermal PlasmaThermal Plasma

This model simulates a plasma at medium pressure (2 torr) where the plasma is still not in local thermodynamic equilibrium. At low pressures the two temperatures are decoupled but as the pressure increases the temperatures tend towards...

3D Model of an ICP Reactor with Argon Chemistry3D Model of an ICP Reactor with Argon Chemistry

3D plasma modeling is possible to do in COMSOL. A square coil is placed on top of a dielectric window and is electrically excited at 13.56MHz. A plasma is formed in the chamber beneath the dielectric window, which contains Argon gas at...

In-Plane Microwave PlasmaIn-Plane Microwave Plasma

Wave heated discharges may be very simple, where a plane wave is guided into a reactor using a waveguide, or very complicated as in the case with ECR (electron cyclotron resonance) reactors. In this example, a wave is launched into...