FEM Simulation of the Scanning Electrochemical Potential Microscopy (SECPM)

R. Hamou, P. Biedermann, M. Rohwerder, and A. Blumeneau
Max-Planck-Institut für Eisenforschung GmbH, Düsseldorf, Germany
Published in 2008

The present work focuses on modeling a new experimental technique: Scanning Electro-chemical Potential Microscopy (SECPM), which is used to probe the potential profile of the electric double layer (EDL).

We used an electrostatic approach to compute the EDL potential measured within the metallic probe. Also, we investigated the effect of the interaction of the electrode/probe double layers on the distribution of the ions.

Mapping the concentration gradient between the probe and the working electrode along the approach gives insight into the charge distribution and the potential at the probe.

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